Electronics and Photonics |
|||
| Session 370 - Plasma-Assisted and Thermal ChEmical Vapor Deposition | |||
| Deposition of thin films using thermal decomposition of metal-organic and organometallic precursors. Characterization of films deposited from CVD. | |||
| Chair: | Sang M. Han | ||
| CoChair: | John G. Ekerdt | ||
| 370a | An Analysis of the Deposition Mechanisms Involved during Self-Limiting Growth of Metal Oxides by Pulsed PECVD Michael T. Seman, David N. Richards, Colin A. Wolden |
||
| 370b | Kinetic Monte Carlo Simulations of Surface Growth during Plasma Deposition of Silicon Thin Films Sumeet C. Pandey, Tejinder Singh, Dimitrios Maroudas |
||
| 370c | Investigation of the Growth Mechanism during Plasma-Assisted Deposition of a-C:H Bhavin N. Jariwala, Cristian V. Ciobanu, Sumit Agarwal |
||
| 370d | Remote Atmospheric Pressure Plasma Activation of Polymers Eleazar Gonzalez II, Michael Barankin, Peter C. Guschl, Robert F. Hicks |
||
| 370e | Thin-Film Deposition on Nanoparticles and Nanowires In Low-Pressure Plasma Anaram Shahravan, Themis Matsoukas |
||
| 370f | Multiferroic BiFeO3 Thin Films Deposited by MOCVD Method Manish Singh, Yi Yang, Christos G. Takoudis |
||
| 370g | Interesting Characteristics of a Vapor-Deposited Silica Thin Film A. Anderson, W. Robert Ashurst |
||
See more of Materials Engineering and Sciences Division
See more of The 2008 Annual Meeting